Main performance and structure features:
1.The area density meter and die can form aclosed-loop control.
2.CCD system with closed-loop control for dimension detection.
3.Paste termination tape on the tailings.
4.Double layer slurry can be coated on the same side of the substrate.
5.Work together with MES system and managere mote cloud control for equipment.
Quality monitoring and feedback:
1.Area density meter in X/ B ray for on-line detection.
2.CCD system for dimension and flaw detection.
3.NG mark inkjet print.
4.Temperature measurement via IR on the surface ofelectrode inside the oven.
5.The mass flowmeter monitors online for the flow,viscosity and temperature.
6.NMP concentration monitoring for cathode oven andhumidity detection for anode oven.
Main Technical Parameters:
Suitable Slurry | LFPLCO,LMO,ternary, graphite, silicon carbon, etc |
Coating Mode | Extrusion coating |
Substrate Width/Substrate Thickness | Max:1400mm/Cu:min4.5um;/AL:Min9um |
Roller Surface Width | Max:1600mm |
Coating Width | Max:1400mm |
Coating Speed | ≤90m/min |
Coating Weight Accuracy | ±1% |
Heating Method | Electrical heating/steam heating/oil heating |
Note: Specific parameters are subject to contract agreement